99.999% ULE Reflective Mirror

99.999% Ultra-Low Expansion (ULE) Reflective Mirrors

When every nanometer counts, the 99.999% ULE Reflective Mirror delivers unmatched stability for mission-critical optics. Made from ultra-pure Corning ULE® glass, these mirrors maintain sub-ångström precision even under extreme temperatures and high-energy EUV exposure. Whether you’re refining 3nm semiconductor nodes or calibrating laser gyroscopes, our mirrors eliminate thermal drift and distortion risks that compromise optical systems.

Why Choose Our ULE Reflective Mirrors?

• Zero Thermal Distortion: With a near-zero CTE (0 ± 30 ppb/°C), our mirrors stay dimensionally stable from -50°C to 150°C, critical for semiconductor lithography and space-based sensors. This stability prevents misalignment in high-heat industrial tools or cold orbital environments, ensuring consistent performance where thermal shifts would ruin precision.​
• Atomic-Level Smoothness: Surface roughness <0.5 nm RMS ensures 99.999% reflectivity for EUV wavelengths (13.5 nm), vital for 3nm chip manufacturing. This ultra-smooth finish minimizes light scatter, enabling accurate patterning of tiny circuits in advanced fabs where even nanoscale imperfections compromise yields.​
• Built to Last: Multilayer coatings resist degradation, offering 18+ months of uninterrupted performance in 24/7 fabs, reducing downtime for replacements. These coatings withstand plasma etching byproducts and frequent cleaning, maintaining reflectivity in harsh semiconductor manufacturing environments.​
• Custom-Ready: Tailored diameters (up to 500mm), coatings, and mounting solutions for your tool’s unique geometry, ensuring seamless integration into lithography systems or laser setups. This customization optimizes optical efficiency, eliminating fit issues that could hinder performance in specialized industrial equipment.

Parameters

Applications Where Precision Matters Most

• EUV Lithography Machines: Reflect 13.5 nm light with minimal energy loss for sharper wafer patterning, critical for producing 3nm and smaller semiconductor chips. Atomic-level smoothness ensures 99.999% reflectivity, while zero thermal distortion prevents misalignment, boosting yield in high-volume fabs where precision directly impacts production efficiency.​
• Laser Wafer Inspection: Detect sub-3nm defects using distortion-free beam steering, enabled by mirrors with <0.5 nm RMS roughness. This precision ensures accurate defect mapping across wafers, helping manufacturers identify flaws early and reduce scrap rates in advanced chip production.​
• High-Power Laser Systems: Handle kW-level beams without surface warping or coating damage, thanks to durable multilayer coatings and thermal-stable substrates. These mirrors maintain integrity in 24/7 industrial settings, preventing performance drops in cutting, welding, or material processing applications.​
• Space Optics: Withstand orbital thermal swings while maintaining optical alignment, leveraging near-zero CTE materials that resist dimensional changes from -50°C to 150°C. This stability ensures consistent imaging in satellites and telescopes, where thermal-induced misalignment would compromise mission-critical data.

Trusted by Leaders in Precision Optics

> “Switching to their 99.999% ULE Reflective Mirror reduced our lithography tool downtime by 40%.”– Top 5 Semiconductor OEM

> “Zero coating delamination after 9 months in our high-vacuum EUV chamber.”​​​​​​​– Advanced Optics Lab

Global Support, Local Speed

• Fast Prototyping: Get custom designs in 8-12 weeks with AI-optimized metrology.
• Risk-Free Testing: Request samples with performance guarantees.
• Supply Chain Assurance: DDP shipping, consignment stock, and 24/7 tech support across 15 countries.

FAQs: Your Top Questions Answered

1. How does 99.999% purity improve EUV performance?

Ultra-pure ULE glass minimizes light scattering, ensuring >99.999% reflectivity for maximum lithography tool efficiency.

2. Can I get non-standard 99.999% ULE Reflective Mirror shapes?

Yes – we specialize in elliptical, rectangular, and asymmetrical designs for niche optical setups.

3. What cleaning methods are safe?

Use CO2 snow or plasma cleaning – we provide detailed protocols with every order.

4. How long do coatings last?

Our EUV-optimized multilayers retain >95% reflectivity for 10,000+ exposure hours.

5. Do you support small-batch R&D orders?

Absolutely. We work with startups and research labs on orders as low as 5 units.

Ready to Eliminate Thermal Drift?

Questions? Contact our optics team: xachaona@163.com about 99.999% ULE Reflective Mirror.