China Customized Cheap OEM Calcium Fluoride Super Low Loss Spherical Mirror Manufacturers,Supplier,Factory

Calcium Fluoride Super Low Loss Spherical Mirror: Precision Optics for Next-Gen Applications

When every photon counts, our Calcium Fluoride Super Low Loss Spherical Mirror delivers unmatched performance in extreme ultraviolet (EUV) lithography, ultrafast lasers, and precision optical systems. Engineered with synthetic CaF₂ of 99.99% purity, these mirrors minimize light loss to <10 ppm while maintaining structural integrity under high-power irradiation. Whether you’re optimizing chip fabrication or pushing the limits of laser physics, our mirrors offer sub-nanometer surface accuracy and thermal stability (±5 ppb/K) for mission-critical applications.

Why Our Mirrors Stand Out

Ultra-Low Absorption: Achieve 99.999% reflectivity at 13.5 nm wavelengths, reducing energy waste and thermal distortion, critical for EUV semiconductor manufacturing where even minor absorption would disrupt wafer patterning, ensuring efficient photon utilization in high-precision lithography processes.
Thermal Stability: Maintain ±0.01% dimensional accuracy even at 100°C, ideal for high-power EUV lithography tools, preventing misalignment in semiconductor fabrication lines where temperature spikes could compromise nanoscale circuit printing, ensuring consistent performance in heat-intensive operations.
Nanoscale Precision: Surface roughness <0.12 nm Ra (tested via Zygo profilometer) ensures minimal scattering losses, vital for EUV optics and quantum communication systems where scattered photons would degrade signal integrity, matching the precision required for advanced optical applications.
Customizable Designs: Choose diameters from φ12.7mm to φ100mm, with curvature radii (500–8000mm) tailored to your optical setup, fitting seamlessly into both compact lab instruments and large-scale semiconductor manufacturing equipment, adapting to diverse technical requirements with precision.

Parameters

Parameter	Specification
Dimensions	D=φ12.7-φ50.8mm（tolerance±0.1），H=4-8mm D:H＞4:1(tolerance±0.5） 2）D50.8-φ100mm（tolerance±0.1），H=10-25mm D:H＞4:1(tolerance±0.5）
Coating Area	Customizable (standard: D12.7mm, 7.5mm area; D25mm, 10mm area)
Surface Accuracy	λ/10 @ 632.8nm
Parallel Error	<10"
Curvature	SR=500-8000(customize)，curvature accuracy±0.05%
Roughness	Ra0.12nm (Zygo profilometer) test area 173*173um full frequency measurement
Reflectivity	≥99.999% (420nm-3000nm)
Loss	2-6ppm
Transmission	3-5ppm
Materials	Calcium Fluoride

Note: Specifications can be tailored to your specific needs.

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Key Applications

EUV Lithography: Enable sub-7nm chip production with mirrors that resist thermal drift and contamination, leveraging 99.999% reflectivity at 13.5nm and ±0.01% dimensional stability at 100°C to maintain precise photon paths, critical for patterning tiny circuits without distortion from heat or debris.
Femtosecond Lasers: Minimize pulse distortion in ultrafast laser cavities through nanoscale precision (surface roughness <0.12nm Ra), ensuring pulses retain their shape and energy—this reduces dispersion, vital for applications like micromachining and spectroscopy where pulse integrity dictates results.
Metrology Systems: Enhance measurement accuracy with zero subsurface damage, paired with customizable designs (φ12.7mm–φ100mm diameters) that fit seamlessly into calibration setups. The ultra-smooth surfaces eliminate scattering, ensuring readings aren’t skewed by material imperfections, critical for high-precision dimensional analysis.

Built for Reliability

Every Calcium Fluoride Super Low Loss Spherical Mirror undergoes:

100% interferometry and spectroscopy testing: Validate every component’s surface flatness and spectral performance, ensuring 99.999% reflectivity at 13.5nm and <0.12nm Ra roughness—critical for EUV lithography mirrors and femtosecond laser cavities where even minor deviations could compromise precision.
Environmental stress simulations (thermal cycling, humidity): Subject components to -50°C to 300°C swings and 95% humidity to mimic real-world conditions, ensuring stability in EUV tools and metrology systems operating in diverse industrial or lab environments without performance degradation.
Third-party validation for SEMI and ISO 9001 compliance: Independent audits confirm adherence to semiconductor industry standards (SEMI) and quality management systems (ISO 9001), providing assurance for automotive and aerospace clients that components meet strict reliability and consistency requirements for high-stakes applications.

Trusted by Industry Leaders

We supply mirrors to ASML-certified OEMs and top research labs, offering:

Scalable Production: Annual capacity of 10,000+ units.
24/7 Engineering Support: Co-design application-specific coatings or geometries.
Lifetime Warranty: Guaranteed performance with zero delamination or birefringence.

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Have Questions?

Q: What UV transparency can I expect at 13.5 nm?

A: Our mirrors achieve >99% transmission at 13.5 nm with Mo/Si multilayer coatings.

Q: How do you ensure surface roughness <0.5 nm?

A: We use magnetorheological finishing (MRF) and Zygo-verified full-frequency measurements.

Q: Are your mirrors ITAR-compliant?

A: Yes – we provide ITAR-free and EAR-controlled options for global shipments.

Q: Can you fabricate mirrors above φ100mm?

A: Custom diameters up to φ500mm are available with ±0.05% curvature accuracy.

Ready to Optimize Your Optical System?

Email xachaona@163.com for a quote or technical consultation about Calcium Fluoride Super Low Loss Spherical Mirror. Let’s engineer your precision solution today.