Calcium Fluoride Super Low Loss Flat Concave Mirror

 Precision Optics for Demanding Applications

Our Calcium Fluoride Super Low Loss Flat Concave Mirror is designed for engineers and researchers who require uncompromising performance at ultraviolet (UV) wavelengths. Made from ultra-high-purity synthetic calcium fluoride (CaF₂), these mirrors deliver <0.05% absorption loss at 193nm and 248nm—critical for semiconductor lithography, laser beam shaping, and metrology systems where thermal drift and scatter can derail precision.

Key Specifications at a Glance

Where Our Mirrors Excel

1️⃣ DUV Lithography Systems: Maintain beam integrity in high-NA optics with minimal wavefront distortion, even under prolonged UV exposure, using radiation-hardened substrates and λ/10 surface accuracy—critical for patterning sub-7nm features where distortion would ruin circuit precision in advanced semiconductor fabrication.​

2️⃣ Laser Processing Tools: Withstand high-power excimer lasers while resisting thermal lensing—ideal for micromachining and thin-film ablation, leveraging low absorption coatings (<5 ppm loss) and thermal stability up to 300°C to prevent beam warping, ensuring consistent cuts in electronics manufacturing and medical device production.​

3️⃣ Wafer Inspection: Achieve <0.1% scatter loss for detecting sub-10nm defects in advanced nodes, thanks to sub-ångström smoothness (<0.12nm Ra) that eliminates false readings from surface irregularities, enabling reliable quality control in 3nm and beyond chip production lines.​

4️⃣ Metrology Setups: Enable phase-sensitive EUV measurements with λ/10 surface flatness, paired with 99.999% reflectivity to preserve signal integrity, ensuring precise dimensional analysis in semiconductor metrology where measurement errors could compromise device performance validation.

Trusted Compliance

• ✅ ISO 9001:2015 Certified: Ensures consistent quality management across production, from DUV lithography components to metrology mirrors, with strict process controls that minimize variability—critical for semiconductor fabs relying on uniform performance in high-NA optics and inspection tools.​
• ✅ SEMI F47 Contamination Control: Meets strict particle and outgassing standards for cleanroom environments, preventing microcontamination in DUV lithography and wafer inspection setups where even tiny particles could ruin sub-10nm features during semiconductor manufacturing.​
• ✅ RoHS/REACH Compliant: Eliminates restricted substances in materials, ensuring safe integration into laser processing tools and metrology systems, aligning with global environmental regulations for electronics manufacturing, from EU-based fabs to Asian semiconductor hubs.​
• ✅ Full Material Traceability: Tracks every component from raw substrate to final coating, enabling root-cause analysis for any performance issues in lithography or laser processing setups, supporting quality audits and reliability validation in advanced semiconductor production.​

Tailored to Your Needs

We specialize in custom solutions:

• Curvature Radii: 100mm – 2000mm
• Apertures: Ø10mm – Ø300mm
• Coatings: Dual-wavelength AR, protective layers
• Batch Consistency: Lot-to-lot CV <2%

Why Engineers Choose Us

• 15+ Years in DUV Optics
• 98% On-Time Delivery for orders >500 units
• <0.1% Defect Rate (MIL-STD-883 tested)
• Global Logistics with SEMI-certified partners

Ready to Optimize Your Optical System?

1. 📩 Request Custom Quote (48hr Response)

2. 📥 Download Full Datasheet

3. 🕒 Schedule Engineering Consultation

Frequently Asked Questions

❓ How do these Calcium Fluoride Super Low Loss Flat Concave Mirror maintain UV transparency?

Our proprietary crystal growth process eliminates impurities that cause UV absorption, ensuring >99% transmittance at 193nm even after 10,000+ laser cycles.

❓ What cleaning methods are safe?

Use filtered nitrogen gas or a 1:1 IPA/deionized water solution. Avoid mechanical wiping unless absolutely necessary.

❓ Can you meet non-standard sizes?

Yes! We’ve produced mirrors up to Ø300mm with curvature radii down to 50mm for EUV research tools.

❓ How is thermal stability achieved?

We optimize mirror geometry using FEM simulations to compensate for CaF₂’s thermal expansion coefficient (18.9×10⁻⁶/K).

Have more questions?

Contact our optical engineers at xachaona@163.com for personalized support.

Optimize your optical performance with the Calcium Fluoride Super Low Loss Flat Concave Mirror—where precision meets reliability.