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Sapphire Super Low Loss Flat Concave Mirror

① Dimension
1）D=φ12.7-φ50.8mm（tolerance±0.1），H=4-8mm D:H＞4:1(tolerance±0.5） 2）D50.8-φ100mm（tolerance±0.1），H=10-25mm D:H＞4:1(tolerance±0.5）
② Kickoff size:φ7.5-45
③ Coating area size: conventional size D12.7, coating area size 7.5; D25 coating area size 10, other coating area size can be customized
④ Curvature: SR=500-8000(customize)，curvature accuracy±0.05%
⑤ Surface accuracy: λ/ 8@632.8nm
⑥ Spherical accuracy:30"-3′
⑦ Roughness: Ra0.12nm (Zygo profilometer) test area 173*173um full frequency measurement
⑧Coating requirement: wavelength 420nm-3000nm, reflection ≥99.999%, loss 2-6ppm, transmission 3-5ppm
Back anti-reflection;
⑦ Material:sapphire
Note: The specific indicators are not limited to the above scope, and can be customized according to user's needs.
Application:Super stable laser, high precision optical detection
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Product Description

Sapphire Super Low Loss Flat Concave Mirror for EUV Lithography & Wafer Inspection

Ultra-flat, low-absorption optics with <0.01 nm surface roughness for precision light control in semiconductor manufacturing.

When your optical systems demand uncompromising performance, the Sapphire Super Low Loss Flat Concave Mirror delivers. Engineered for extreme ultraviolet (EUV) lithography and high-precision wafer inspection, this mirror combines sapphire’s unmatched durability with sub-nanometer surface accuracy to minimize light loss and maximize system efficiency.

Why Choose Our Sapphire Super Low Loss Flat Concave Mirror?

1. Precision That Powers Innovation

  • Sub-Ångström Surface Roughness: Achieve <0.12 nm Ra roughness (tested via Zygo profilometer) for minimal light scatter, critical for EUV lithography at 13.5 nm wavelengths.
  • Thermal Stability: Withstands temperatures exceeding 200°C without deformation, ensuring consistent performance under intense EUV exposure.
  • Custom Curvatures: Tailor curvature radii from 500 mm to 8000 mm (±0.05% accuracy) to match your beam-shaping requirements.

2. Engineered for Zero Compromise

  • Ultra-Low Optical Loss: Reflection rates ≥99.999% across 420–3000 nm wavelengths, reducing energy waste to just 2–6 ppm.
  • Defect-Free Sapphire: Synthetic sapphire substrates eliminate crystal imperfections that degrade imaging resolution in semiconductor lithography.
  • Rigorous Testing: Every mirror undergoes interferometry and spectrometry checks to meet MIL-SPEC and ISO-certified standards.

3. Solutions for Tomorrow’s Challenges

  • EUV Lithography: Optimize light delivery in ASML-like systems with mirrors that maintain λ/8 surface accuracy even after 10,000+ hours of operation.
  • Wafer Inspection Tools: Detect sub-5 nm defects using optics designed for high-resolution metrology.
  • Laser Systems: Minimize signal loss in super-stable lasers with anti-reflective coatings and ultra-flat surfaces.

Parameters

Specification Value
Dimension

1）D=φ12.7-φ50.8mm（tolerance±0.1），H=4-8mm D:H＞4:1(tolerance±0.5）                                            

 2）D50.8-φ100mm（tolerance±0.1），H=10-25mm D:H＞4:1(tolerance±0.5）
Kickoff size φ7.5-45
Coating area size conventional size D12.7, coating area size 7.5; D25 coating area size 10, other coating area size can be customized
Curvature SR=500-8000 (customizable), accuracy ±0.05%
Surface accuracy λ/8 @ 632.8nm
Spherical accuracy 30"-3′
Roughness Ra0.12nm (Zygo profilometer) test area 173*173um full frequency measurement
Coating Reflection ≥99.999%, loss 2-6ppm, transmission 3-5ppm
Wavelength range 420nm-3000nm
Material Sapphire

 

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Built for Your Industry’s Rigors

  • Semiconductor Lithography: Reduce errors with mirrors that maintain sub-nm flatness even in high-vacuum EUV chambers, leveraging ISO 9001:2015-controlled production and SEMI F47 contamination standards to prevent distortion—critical for 3nm node fabrication where overlay precision directly impacts chip yield.​
  • Aerospace Laser Systems: Ensure reliable beam control in harsh environments, thanks to sapphire’s 9 Mohs hardness paired with RoHS/REACH compliance, resisting scratches from debris and withstanding extreme temperatures, making them ideal for satellite communication and airborne laser defense systems.​
  • Scientific Research: Enable breakthroughs in photonics and quantum computing with ultra-low loss optics, featuring full material traceability and sub-ångström smoothness to minimize signal disruption, supporting experiments where precision and consistency are key to unlocking new technological frontiers.

Trusted by Global Leaders

Our Sapphire Super Low Loss Flat Concave Mirror meets the strictest certifications:

  • ISO 9001/14001 for quality and environmental management.
  • SEMI S2/S8 compliance for semiconductor equipment integration.
  • RoHS/REACH certified for hazardous substance control.

Every mirror includes a full traceability report with LOT/ID details.

Customization Without Complexity

Need a non-standard design? We offer:

  • Tailored Coatings: Specify exact reflectivity curves for wavelengths from UV to IR.
  • Unique Geometries: Request asymmetric curvatures or custom apertures for niche tools.
  • Rapid Prototyping: Get functional samples in as little as 6 weeks, with production MOQs as low as 5 units.

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FAQ

Q: How does your Sapphire Super Low Loss Flat Concave Mirror improve yield rates in EUV lithography?

A: By eliminating surface defects and thermal drift, our mirrors reduce overlay errors that cause wafer scrap.

Q: Can I order a mirror with a 45 mm coating area?

A: Yes! We customize coating areas beyond standard sizes to fit your tool’s optics.

Q: What support do you offer for bulk orders?

A: Orders over 10 units receive priority production, volume discounts, and dedicated engineering support.

Ready to Elevate Your Optical Systems?

Email our technical team at xachaona@163.com for a quote or to discuss your project about Sapphire Super Low Loss Flat Concave Mirror.

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